Initial stage of the electrodeposition of Ag on Au(100) observed by in-situ atomic force microscopy

被引：35

作者：

Ikemiya, N

Yamada, K

Hara, S

机构：

[1] Dept. of Mat. Science and Processing, Faculty of Engineering, Osaka University, Suita, 565

来源：

SURFACE SCIENCE | 1996年 / 348卷 / 03期

关键词：

atomic force microscopy; epitaxy; gold; metal-electrolyte interfaces; silver;

D O I：

10.1016/0039-6028(95)01030-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have investigated atomic structures as well as growth morphologies of thin Ag films on Au(100) under acidic solutions by an in-situ AFM. In the UPD region, the pseudomorphic (1 x 1)-Ag layer for a first monolayer is formed through the c(root 2 x 5 root 2)R45 degrees-Ag structure (coverage, theta=0.6) in both HClO4 and H2SO4 solutions. In the bulk deposition region, the Ag films are formed by an ideal layer-by-layer growth mode (Frank-Van der Merwe mode) even at a high deposition rate (similar to 7.2 ML/min), which suggests that the surface diffusion process of Ag adatoms is extremely rapid. Noteworthy is that the preferential Ag deposition at regions with higher step densities or imperfections resulted in the extremely flat Ag films.

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页码：253 / 260

页数：8

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