High resolution lithography with PDMS molds

被引：95

作者：

Bender, M

Plachetka, U

Ran, J

Fuchs, A

Vratzov, B

Kurz, H

Glinsner, T

Lindner, F

机构：

[1] AMO GmbH, AMICA, D-52074 Aachen, Germany

[2] EV Grp, A-4780 Scharding, Austria

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2004年 / 22卷 / 06期

关键词：

D O I：

10.1116/1.1824057

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The resolution, dimension stability, and reproducibility of the Soft UY-Nanoimprint is investigated. The potential for imprinting nanostructures with flexible molds in UV-curable resists in the 100 nm regime are explored and the limitations analyzed. The dimensional stability of imprinted patterns is determined by the deformation of the mold that in term depends on the geometry of the structure's and the imprint pressure applied. (C) 2004 American Vacuum Society.

引用

页码：3229 / 3232

页数：4

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