Characteristics of ZnO:Zn phosphor thin films by post-deposition annealing

被引:50
作者
Li, W [1 ]
Mao, DS
Zhang, F
Wang, X
Liu, XH
Zou, SC
Zhu, YK
Li, Q
Xu, JF
机构
[1] Chinese Acad Sci, Shanghai Inst Met, Ion Beam Lab, Shanghai 200050, Peoples R China
[2] E China Normal Univ, Dept Elect Sci & Technol, Shanghai 200062, Peoples R China
关键词
ZnO : Zn; phosphor thin films; annealing; photoluminescence;
D O I
10.1016/S0168-583X(00)00017-3
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
ZnO:Zn phosphor thin films were prepared by ion beam assisted deposition (IBAD). Post-deposition annealing of these films was performed at temperature from 100 degrees C to 1000 degrees C in N-2 and air, respectively. Several analysis techniques were employed to characterize their composition, structure and photoluminescence. Two different bands of luminescent peaks, which are UV/violet (380-420 nm) and blue/green (470-530 nm) luminescence, were found in the PL spectra of these films. The results show that the intensity of the blue/green light is strongly affected by the temperature of annealing which may result from the recovery of structural defects, the homogenization and the evaporation of excess Zn. However, the contributions of these processes are different at different temperature ranges. We also find that the films annealed in N-2 ambient show stronger luminescent intensity than those in air ambient. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:59 / 63
页数:5
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