High temperature, high voltage operation of diamond Schottky diode

被引:66
作者
Vescan, A [1 ]
Daumiller, I [1 ]
Gluche, P [1 ]
Ebert, W [1 ]
Kohn, E [1 ]
机构
[1] Univ Ulm, Dept Elect Devices & Circuits, D-89081 Ulm, Germany
关键词
diamond Schottky diode; high temperature; high voltage;
D O I
10.1016/S0925-9635(97)00200-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Very high temperature operation of homoepitaxial diamond Schottky diodes is demonstrated with rectifying behaviour up to 800 degrees C. The Schottky material is p(+)-Si with a chemically stabilized Si-diamond interface, leading to significantly reduced thermal activation of the reverse currents. On diamond films with low surface doping concentration 150 V breakdown voltage at room temperature is observed. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:581 / 584
页数:4
相关论文
共 8 条
[1]  
[Anonymous], 1988, METAL SEMICONDUCTOR
[2]   High-voltage Schottky diode on epitaxial diamond layer [J].
Ebert, W ;
Vescan, A ;
Gluche, P ;
Borst, T ;
Kohn, E .
DIAMOND AND RELATED MATERIALS, 1997, 6 (2-4) :329-332
[3]  
Field J.E., 1979, PROPERTIES DIAMOND
[4]  
GLUCHE P, 1996, 3 HIGH TEMP EL C ALB
[5]   Hydrogen-terminated diamond surfaces and interfaces [J].
Kawarada, H .
SURFACE SCIENCE REPORTS, 1996, 26 (07) :205-259
[6]  
MNZINGER P, 1995, DIAM RELAT MATER, V4, P458
[7]   I/V CHARACTERISTICS OF EPITAXIAL SCHOTTKY AU BARRIER DIODE ON P(+) DIAMOND SUBSTRATE [J].
VESCAN, A ;
EBERT, W ;
BORST, T ;
KOHN, E .
DIAMOND AND RELATED MATERIALS, 1995, 4 (5-6) :661-665
[8]  
VESCAN A, 1995, ELECTROCHEMICAL SOC, V944