Reactive magnetron sputtering of indium tin oxide films on acrylics - Electrical resistivity and optical properties

被引：10

作者：

Huang, JL ^{[1
]}

Jah, YT ^{[1
]}

Chen, CY ^{[1
]}

Yau, BS ^{[1
]}

Lin, SS ^{[1
]}

机构：

[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 701, Taiwan

来源：

JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE | 2000年 / 9卷 / 04期

关键词：

acrylics; indium tin oxide; optical properties; reactive sputtering; resistivity;

D O I：

10.1361/105994900770345827

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effects of processing parameters on the deposition rate lattice parameters, stoichiometric compositions, surface morphology, and bonding state of indium tin oxide (ITO) films on acrylics had been previously reported. This study was a continuation of the previous investigation and focused on the electrical resistivity and optical properties of ITO films. The electrical resistivity decreased and then increased with oxygen flow rate. This was due to the effects of oxygen vacancies and impurity scattering. The resistivity of ITO films decreased with the applied bias voltage and film thickness. The transmittance of visible light increased with the oxygen flow rate and decreased with film thickness. Films deposited at oxygen flow rates having low electrical resistivity also had higher infrared radiation (IR) reflectance.

引用

页码：424 / 427

页数：4

共 17 条

[1] DEPOSITION OF INDIUM TIN OXIDE-FILMS ON ACRYLIC SUBSTRATES BY RADIOFREQUENCY MAGNETRON SPUTTERING [J].

CHIOU, BS ;

HSIEH, ST ;

WU, WF .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1994, 77 (07) :1740-1744

[2] TRANSPARENT, CONDUCTING INDIUM TIN OXIDE-FILMS FORMED ON LOW OR MEDIUM TEMPERATURE SUBSTRATES BY ION-ASSISTED DEPOSITION [J].

DOBROWOLSKI, JA ;

HO, FC ;

MENAGH, D ;

SIMPSON, R ;

WALDORF, A .

APPLIED OPTICS, 1987, 26 (24) :5204-5210

[3] VARIATIONS IN STRUCTURAL AND ELECTRICAL-PROPERTIES OF MAGNETRON-SPUTTERED INDIUM TIN OXIDE-FILMS WITH DEPOSITION PARAMETERS [J].

DUTTA, J ;

RAY, S .

THIN SOLID FILMS, 1988, 162 (1-2) :119-127

[4] TRANSPARENT HEAT-REFLECTING COATINGS BASED ON HIGHLY DOPED SEMICONDUCTORS [J].

FRANK, G ;

KAUER, E ;

KOSTLIN, H .

THIN SOLID FILMS, 1981, 77 (1-3) :107-117

[5]

Furusaki T, 1994, J CERAM SOC JPN, V102, P202

[6] MICROSTRUCTURE AND ELECTRICAL CHARACTERISTICS OF SPUTTERED INDIUM TIN OXIDE-FILMS [J].

HIGUCHI, M ;

SAWADA, M ;

KURONUMA, Y .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (06) :1773-1775

[7] Investigation of reactive magnetron sputtering of indium tin oxide films on acrylics - Lattice parameters and stoichiometric compositions [J].

Huang, JL ;

Jah, YT ;

Yau, BS ;

Lo, WT .

JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 2000, 108 (01) :17-20

[8]

HUANG JS, IN PRESS THIN SOLID

[9] TEMPERATURE-DEPENDENCE OF TRANSPORT-PROPERTIES OF EVAPORATED INDIUM TIN OXIDE-FILMS [J].

HUANG, KF ;

UEN, TM ;

GOU, YS ;

HUANG, CR ;

YANG, HC .

THIN SOLID FILMS, 1987, 148 (01) :7-15

[10] CHEMICAL VAPOR-DEPOSITION OF TRANSPARENT ELECTRICALLY CONDUCTING LAYERS OF INDIUM OXIDE DOPED WITH TIN [J].

KANE, J ;

SCHWEIZER, HP ;

KERN, W .

THIN SOLID FILMS, 1975, 29 (01) :155-163

← 1 2 →