Work function dependence on the thickness and substrate of carbon contamination layers by Kelvin probe force microscopy

被引:8
作者
Alessandrini, A
Valdrè, U
机构
[1] Univ Bologna, Ist Nazl Fis Mat, I-40126 Bologna, Italy
[2] Univ Bologna, Dept Phys, I-40126 Bologna, Italy
关键词
D O I
10.1080/0950083031000137857
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The contact potential difference (CPD) between carbon contamination (CC) layers and the several substrates on which they were deposited has been measured as a function of the film thickness by means of Kelvin probe force microscopy (KPFM). The observed CPD trends may be divided into three categories: (i) an increase, or decrease, in CPD with thickness up to a saturation value with sign inversion with respect to the substrates (Al and Si); (ii) an oscillation with no sign inversion (substrates, gold and platinum); (iii) an oscillation through sign inversion (palladium substrate). Effects (ii) and (iii) seem to be typical of CC, since they have not been observed for other materials, including evaporated carbon. Several possible causes of the above two effects are examined, but a satisfactory interpretation has not been found yet. The sensitivity of KPFM is such that CC layers 10 nm thick are easily visible, whereas they are hardly detectable by topography.
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页码:441 / 451
页数:11
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