Surface precipitates on single crystal LiNbO3 after dry-etching by CHF3 plasma

被引:15
作者
Shima, K
Mitsugi, N
Nagata, H
机构
[1] Sumitomo Osaka Cement Co Ltd, New Technol Res Labs, Adv Mat Res Div, Funabashi, Chiba 274, Japan
[2] Sumitomo Osaka Cement Co Ltd, New Technol Res Labs, Optoelect Res Div, Funabashi, Chiba 274, Japan
关键词
D O I
10.1557/JMR.1998.0068
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The CHF3 electron cyclotron resonance (ECR) plasma etched LiNbO3 (LN) surface was analyzed chemically and crystallographically to investigate the dry-etch machining process for LN crystal, which was recently needed to obtain broader-band optical modulators. The etched surface was entirely covered with amorphous-like precipitates having similar to 70 nm diameter. These precipitates (or a part of them) were thought to be LiF from Auger electron and x-ray photoelectron spectroscopy. The results indicated that the LiF was formed and remained on the etched surface while the Nb was almost completely removed.
引用
收藏
页码:527 / 529
页数:3
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