Surface precipitates on single crystal LiNbO3 after dry-etching by CHF3 plasma

被引：15

作者：

Shima, K

Mitsugi, N

Nagata, H

机构：

[1] Sumitomo Osaka Cement Co Ltd, New Technol Res Labs, Adv Mat Res Div, Funabashi, Chiba 274, Japan

[2] Sumitomo Osaka Cement Co Ltd, New Technol Res Labs, Optoelect Res Div, Funabashi, Chiba 274, Japan

来源：

JOURNAL OF MATERIALS RESEARCH | 1998年 / 13卷 / 03期

关键词：

D O I：

10.1557/JMR.1998.0068

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The CHF3 electron cyclotron resonance (ECR) plasma etched LiNbO3 (LN) surface was analyzed chemically and crystallographically to investigate the dry-etch machining process for LN crystal, which was recently needed to obtain broader-band optical modulators. The etched surface was entirely covered with amorphous-like precipitates having similar to 70 nm diameter. These precipitates (or a part of them) were thought to be LiF from Auger electron and x-ray photoelectron spectroscopy. The results indicated that the LiF was formed and remained on the etched surface while the Nb was almost completely removed.

引用

页码：527 / 529

页数：3

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