Investigation of humidity-dependent capillary force
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作者:
Xiao, XD
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Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Xiao, XD
[1
]
Qian, LM
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Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Qian, LM
[1
]
机构:
[1] Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Due to the strong capillary condensation, the adhesion force between a Si3N4 atomic force microscope (AFM) tip and silicon oxide was observed to first increase and then decrease with an increase of humidity. in contrast, due to weak capillary condensation, the adhesion force between the AFM tip and the N-octadecyltrimethoxysilane (OTE, CH3(CH2)(17)Si(OCH2CH3)(3)) self-assembled monolayer (SAM) was found to be almost independent of humidity. It was found that the formulation commonly used for macroscopic objects fails to explain our data. Using an accurate formulation and an assumed tip shape, we can explain the observed decrease of adhesion for SiO2 at high humidity as being due to the decreased capillary pressure force when the dimension of the meniscus becomes comparable with the tip size. However, the observed late onset of adhesion of SiO2 cannot be understood within the framework of the classical continuum theory. We attribute this late onset to the properties of an ultrathin water film at molecular thickness. The new formulation predicts a vanishing water meniscus between the AFM tip and OTE over the entire humidity range and can also fully account for the humidity-independent adhesion results for OTE.
机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Fuji, M
Machida, K
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Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Machida, K
Takei, T
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Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Takei, T
Watanabe, T
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Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Watanabe, T
Chikazawa, M
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Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Fuji, M
Machida, K
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机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Machida, K
Takei, T
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机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Takei, T
Watanabe, T
论文数: 0引用数: 0
h-index: 0
机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Watanabe, T
Chikazawa, M
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h-index: 0
机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan