Roughness and oxidation:: application to NiO growth on Ni at 800°C

被引：38

作者：

Huntz, AM ^{[1
]}

Lefevre, B ^{[1
]}

Cassino, F ^{[1
]}

机构：

[1] Univ Paris Sud, LEMHE, CNRS UMR 8647, F-91405 Orsay, France

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2000年 / 290卷 / 1-2期

关键词：

nickel oxidation; NiO roughness; oxidation constant; oxide grain size;

D O I：

10.1016/S0921-5093(00)00944-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The changes with oxidation time of the oxide outer surface roughness, the oxide grain size and the oxidation rate constant k(c) for NiO growth on Ni wire studied at 800 degrees C in 1 atm oxygen. The roughness was determined by optical interferometry establishing 2D-profiles and SD-images. Correlations were found between the variations of the oxide outer surface roughness or the k(c) values and the oxide grain size. These are attributed to the decrease of the oxide grain boundary density with time, which induces a decrease of the effective diffusion coefficient. (C) 2000 Elsevier Science S.A. All rights reserved.

引用

页码：190 / 197

页数：8

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