Defect levels in the band gap of amorphous selenium

被引:30
作者
Benkhedir, ML
Aida, MS
Adriaenssens, GJ
机构
[1] Univ Louvain, Lab Halfgeleiderfys, B-3001 Louvain, Belgium
[2] Univ Mentouri, Phys Mat Lab, Constantine 25000, Algeria
关键词
D O I
10.1016/j.jnoncrysol.2004.08.062
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Energy locations in the band gap have been determined for the thermally accessible levels of the negative-U defect centers in amorphous selenium. Both the temperature dependence of the steady-state photocurrents, and an analysis of emission currents in the post-transit regime of a time-of-flight transient photoconductivity experiment on the same samples, agree on the presence of defect levels at (0.42 +/- 0.04) eV above the valence band mobility edge and (0.53 +/- 0.06) eV below the conduction band. Both measured current levels and the resolved energy positions of the defects are subject to the Poole-Frenkel effect. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:193 / 198
页数:6
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