Surface modification with cross-linked random copolymers: Minimum effective thickness

被引:63
作者
Ryu, Du Yeol
Wang, Jia-Yu
Lavery, Kristopher A.
Drockenmuller, Eric
Satija, Sushi K.
Hawker, Craig J.
Russell, Thomas P.
机构
[1] Yonsei Univ, Dept Chem Engn, Seoul 120749, South Korea
[2] Univ Massachusetts, Polymer Sci & Engn Dept, Amherst, MA 01003 USA
[3] Natl Inst Standards & Technol, Reactor Radiat Div, Gaithersburg, MD USA
[4] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA
关键词
D O I
10.1021/ma062939w
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Ultrathin films of benzocyclobutene (BCB)-functionalized random copolymer with styrene and methyl methacrylate, P(S-r-BCB-r-MMA), with thicknesses ranging from 0 to 10.5 nm, were thermally crosslinked on Si substrates. The penetration of deuterated PMMA (dPMMA) into the P(S-r-BCB-r-MMA) films and the microdomain orientation of PS-b-PMMA diblock copolymers on P(S-r-BCB-r-MMA) coated substrates were investigated by neutron reflectivity (NR) and scanning force microscopy (SFM), respectively. NR measurements on bilayers of dPMMA on cross-linked P(S-r-BCB-r-MMA) showed that the neutron scattering length density (SLD) at the substrate was equal to that of P(S-r-BCB-r-MMA) if the P(S-r-BCB-r-MMA) film was thicker than similar to 5.5 nm. With decreasing thickness of the P(S-r-BCB-r-MMA) film, the SLD at the substrate increased, characteristic of an increasing penetration of the dPMMA. When thin films of PS-b-PMMA diblock copolymer having cylindrical microdomains are, placed on surfaces modified with cross-linked films of P(S-r-BCB-r-MMA) thinner than similar to 5.5 nm, the cylindrical microdomains orient parallel to the surface, whereas for thicker films, the microdomains orient normal to the surface. Both of these results indicate that interfacial interactions are screened when the P(S-r-BCB-r-MMA) film is thicker than similar to 5.5 nm..
引用
收藏
页码:4296 / 4300
页数:5
相关论文
共 39 条
[1]   NEUTRON REFLECTIVITY STUDIES OF THE SURFACE-INDUCED ORDERING OF DIBLOCK COPOLYMER FILMS [J].
ANASTASIADIS, SH ;
RUSSELL, TP ;
SATIJA, SK ;
MAJKRZAK, CF .
PHYSICAL REVIEW LETTERS, 1989, 62 (16) :1852-1855
[2]   Synthesis and morphological behavior of silicon-containing triblock copolymers for nanostructure applications [J].
Avgeropoulos, A ;
Chan, VZH ;
Lee, VY ;
Ngo, D ;
Miller, RD ;
Hadjichristidis, N ;
Thomas, EL .
CHEMISTRY OF MATERIALS, 1998, 10 (08) :2109-2115
[3]   Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication [J].
Black, CT ;
Guarini, KW ;
Milkove, KR ;
Baker, SM ;
Russell, TP ;
Tuominen, MT .
APPLIED PHYSICS LETTERS, 2001, 79 (03) :409-411
[4]   HOW TO MAKE WATER RUN UPHILL [J].
CHAUDHURY, MK ;
WHITESIDES, GM .
SCIENCE, 1992, 256 (5063) :1539-1541
[5]   Geometric control of cell life and death [J].
Chen, CS ;
Mrksich, M ;
Huang, S ;
Whitesides, GM ;
Ingber, DE .
SCIENCE, 1997, 276 (5317) :1425-1428
[6]   Fabrication of nanostructures with long-range order using block copolymer lithography [J].
Cheng, JY ;
Ross, CA ;
Thomas, EL ;
Smith, HI ;
Vancso, GJ .
APPLIED PHYSICS LETTERS, 2002, 81 (19) :3657-3659
[7]   SURFACE-INDUCED ORIENTATION OF SYMMETRIC, DIBLOCK COPOLYMERS - A SECONDARY ION MASS-SPECTROMETRY STUDY [J].
COULON, G ;
RUSSELL, TP ;
DELINE, VR ;
GREEN, PF .
MACROMOLECULES, 1989, 22 (06) :2581-2589
[8]   Control of molecular and microdomain orientation in a semicrystalline block copolymer thin film by epitaxy [J].
De Rosa, C ;
Park, C ;
Lotz, B ;
Wittmann, JC ;
Fetters, LJ ;
Thomas, EL .
MACROMOLECULES, 2000, 33 (13) :4871-4876
[9]   Microdomain patterns from directional eutectic solidification and epitaxy [J].
De Rosa, C ;
Park, C ;
Thomas, EL ;
Lotz, B .
NATURE, 2000, 405 (6785) :433-437
[10]   Long-range order and orientation of cylinder-forming block copolymers on chemically nanopatterned striped surfaces [J].
Edwards, Erik W. ;
Stoykovich, Mark P. ;
Solak, Harun H. ;
Nealey, Paul F. .
MACROMOLECULES, 2006, 39 (10) :3598-3607