Electrostatic quadrupole plasma mass spectrometer and Langmuir probe measurements of mid-frequency pulsed DC magnetron discharges

被引:41
作者
Muratore, C [1 ]
Moore, JJ [1 ]
Rees, JA [1 ]
机构
[1] Colorado Sch Mines, Adv Coatings & Surface Engn Lab, Golden, CO 80401 USA
关键词
pulsed DC; magnetron sputtering; titanium oxide;
D O I
10.1016/S0257-8972(02)00478-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Time-averaged ion energy distributions (IEDs) and time-resolved floating potentials were measured for a range of reverse times at electrodes immersed in a 60 kHz pulsed magnetron discharge, and compared to the DC condition. The time-averaged IEDs correlate well to the time-resolved target voltage waveforms. From the measured data, electron temperatures for both pulsed and DC discharges were calculated to be approximately 2.5-3.0 eV, even at the 'positive spike' on the cathode voltage waveform observed during pulsing. Titanium oxide thin films were deposited in pulsed and DC discharges. Structure and properties of the deposited films were measured using glancing incidence X-ray diffraction and nanoindentation. Changes in crystallographic texture and hardness were observed as pulsing conditions were varied. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:12 / 18
页数:7
相关论文
共 11 条
[11]  
Wehner GK, 1970, HDB THIN FILM TECHNO, P3