Charging in scanning electron microscopy "from inside and outside"

被引:81
作者
Cazaux, J [1 ]
机构
[1] UTAP, UFR Sci, LASSI, F-51687 Reims, France
关键词
insulating materials; charging; scanning electron microscopy; environmental scanning electron microscopy; secondary electron emission; Auger electron spectroscopy; electron beam lithography; contamination;
D O I
10.1002/sca.4950260406
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
This paper is an attempt to analyse most of the complicated mechanisms involved in charging and discharging of insulators investigated by scanning electron microscopy (SEM). Fundamental concepts on the secondary electron emission (SEE) yield from insulators combined with electrostatics arguments permit to reconsider, first, the widespread opinion following which charging is minimised when the incident beam energy E-0 is chosen to be equal to the critical energy Edegrees(2) where the nominal total yield deltadegrees+etadegrees = 1. For bare insulators submitted to a defocused irradiation, it is suggested here that the critical energy under permanent irradiation E-2(C) corresponds to a range of primary electrons, R, and nearly equals the maximum escape depth of the secondary electrons, r. This suggestion is supported by a comparison between published data of the SEE yield deltadegrees of insulators (short pulse experiments) and experimental results obtained from a permanent irradiation for E-2(C). New SEE effects are also predicted at the early beginning of irradiation when finely focused probes are used. Practical considerations are also developed, with specific attention given to the role of a contamination layer where a negative charging may occur at any beam energy. The role of the various time constants involved in charging and discharging is also investigated, with special attention given to the dielectric time constant, which explains the dose rate-dependent effects on the effective landing energy in the steady state. Numerical applications permit to give orders of magnitude of various effects, and several other practical consequences are deduced and illustrated. Some new mechanisms for the contrast reversal during irradiation or with the change of the primary electron (PE) energy are also suggested.
引用
收藏
页码:181 / 203
页数:23
相关论文
共 51 条
[1]   ELECTRON TRAPPING IN ELECTRON-BEAM IRRADIATED SIO2 [J].
AITKEN, JM ;
YOUNG, DR ;
PAN, K .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (06) :3386-3391
[2]  
[Anonymous], MAT MODIFICATIONS EL
[3]  
[Anonymous], ADV SCANNING ELECT M
[4]  
Belhaj M, 2000, SCANNING, V22, P352, DOI 10.1002/sca.4950220603
[5]   Time-dependent measurement of the trapped charge in electron irradiated insulators:: Application to Al2O3-sapphire [J].
Belhaj, M ;
Odof, S ;
Msellak, K ;
Jbara, O .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (05) :2289-2294
[6]   Analysis of two methods of measurement of surface potential of insulators in SEM: electron spectroscopy and X-ray spectroscopy methods [J].
Belhaj, M ;
Jbara, O ;
Filippov, MN ;
Rau, EI ;
Andrianov, MV .
APPLIED SURFACE SCIENCE, 2001, 177 (1-2) :58-65
[7]  
BRUNNER M, 1986, SCANNING ELECTRON MI, V2, P377
[9]   Some considerations on the secondary electron emission, δ, from e- irradiated insulators [J].
Cazaux, J .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (02) :1137-1147
[10]   About the charge compensation of insulating samples in XPS [J].
Cazaux, J .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 2000, 113 (01) :15-33