ELECTRON TRAPPING IN ELECTRON-BEAM IRRADIATED SIO2

被引：137

作者：

AITKEN, JM ^{[1
]}

YOUNG, DR ^{[1
]}

PAN, K ^{[1
]}

机构：

[1] MIT,CAMBRIDGE,MA 02139

来源：

JOURNAL OF APPLIED PHYSICS | 1978年 / 49卷 / 06期

关键词：

D O I：

10.1063/1.325241

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3386 / 3391

页数：6

共 26 条

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