INTRODUCTION RATES AND ANNEALING OF DEFECTS IN ION-IMPLANTED SIO2 LAYERS ON SI

[1] FLATNESS AND SURFACE ROUGHNESS OF SOME COMMON THIN FILM SUBSTRATE MATERIALS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (02): : 454 - &

[2] ELLIPSOMETRIC ANALYSIS OF REFRACTIVE-INDEX PROFILES PRODUCED BY ION-IMPLANTATION IN SILICA GLASS [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1973, 6 (09) : 1115 - 1128

[3] Brice D. K., 1970, Radiation Effects, V6, P77, DOI 10.1080/00337577008235048

[4] 3-PARAMETER FORMULA FOR ELECTRONIC STOPPING CROSS-SECTION AT NONRELATIVISTIC VELOCITIES [J]. PHYSICAL REVIEW A, 1972, 6 (05): : 1791 - &

[5] BRICE DK, 1973, ION IMPLANTATION SEM, P171

[6] BRICE DK, 1973, SLA730416 SAND LAB R

[7] DEARNALEY G, 1973, ION IMPLANATION

[8] COMPACTION OF ION-IMPLANTED FUSED SILICA [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (01) : 167 - 174

[9] SENSITIVE TECHNIQUE FOR STUDYING ION-IMPLANTATION DAMAGE [J]. APPLIED PHYSICS LETTERS, 1971, 18 (12) : 581 - &

[10] FAHRNER W, 1971, ION IMPLANTATION SEM, P373

[1] FLATNESS AND SURFACE ROUGHNESS OF SOME COMMON THIN FILM SUBSTRATE MATERIALS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (02): : 454 - &

[2] ELLIPSOMETRIC ANALYSIS OF REFRACTIVE-INDEX PROFILES PRODUCED BY ION-IMPLANTATION IN SILICA GLASS [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1973, 6 (09) : 1115 - 1128

[3] Brice D. K., 1970, Radiation Effects, V6, P77, DOI 10.1080/00337577008235048

[4] 3-PARAMETER FORMULA FOR ELECTRONIC STOPPING CROSS-SECTION AT NONRELATIVISTIC VELOCITIES [J]. PHYSICAL REVIEW A, 1972, 6 (05): : 1791 - &

[5] BRICE DK, 1973, ION IMPLANTATION SEM, P171

[6] BRICE DK, 1973, SLA730416 SAND LAB R

[7] DEARNALEY G, 1973, ION IMPLANATION

[8] COMPACTION OF ION-IMPLANTED FUSED SILICA [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (01) : 167 - 174

[9] SENSITIVE TECHNIQUE FOR STUDYING ION-IMPLANTATION DAMAGE [J]. APPLIED PHYSICS LETTERS, 1971, 18 (12) : 581 - &

[10] FAHRNER W, 1971, ION IMPLANTATION SEM, P373