Metal-organic chemical vapor deposition of Cr2O3 and Nd2O3 coatings.: Oxide growth kinetics and characterization

Thin oxide films of Cr2O3 and Nd2O3 were prepared, using Metal-Organic Chemical Vapor Deposition (MOCVD) technique, to protect stainless steels against corrosion at high temperature. The conditions of precursor volatilization were studied by thermogravimetry. Deposited film growth kinetics depended on the deposition parameters, particularly substrate temperature, gas flow rate and location of substrate in the coating reactor. The influence of the deposition parameters on the deposition rate and the uniformity of the films is discussed. The oxide films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM) and atomic force microscopy (AFM). The aim of this work was to optimize coating parameters in order to prepare mixed Nd2O3-Cr2O3 films, leading to the most important: protective effects under high temperature corrosion conditions. (C) 2000 Elsevier Science B.V. All rights reserved.