Characteristic features of size-selective photoetching of CdS nanoparticles as a means of preparation of monodisperse particles

被引:42
作者
Torimoto, T [1 ]
Nishiyama, H
Sakata, T
Mori, H
Yoneyama, H
机构
[1] Osaka Univ, Fac Engn, Dept Appl Chem, Suita, Osaka 565, Japan
[2] Osaka Univ, Ultra High Voltage Electron Microscopy Res Ctr, Suita, Osaka 565, Japan
关键词
D O I
10.1149/1.1838583
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The photocorrosion behavior of CdS nanoparticle colloid containing particles ranging from 4 to 10 nm was investigated using two kinds of monochromatic light, one of which was prepared by passing light from a Xe lamp through interference filters, and the other was obtained by an Ar ion laser. CdS particles were photocorroded to smaller particles until irradiated photons were not absorbed anymore; and the CdS particles obtained after the complete photocorrosion by laser light were much smaller than those resulting from the use of monochromatic light of comparable wavelength. The size selective photocorrosion with the Ar ion laser allowed the preparation of much smaller particles than those in the original colloid. It was found that the rate of photocorrosion decreased when the pH of the colloid was raised, while the fluorescence intensity due to bandgap transition increased. The importance of hole trap sites in the photodissolution of CdS is discussed based on these findings.
引用
收藏
页码:1964 / 1968
页数:5
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