Solid-liquid interface velocity and diffusivity in laser-melt amorphous silicon

被引：34

作者：

Brambilla, L

Colombo, L

Rosato, V

Cleri, F

机构：

[1] Univ Cagliari, Ist Nazl Fis Mat, I-09042 Monserrato, CA, Italy

[2] Univ Cagliari, Dipartimento Fis, I-09042 Monserrato, CA, Italy

[3] Ente Nuove Tecnol Energia & Ambiente, Ctr Ric Casaccia, I-00100 Rome, Italy

[4] Ist Nazl Fis Mat, I-00100 Rome, Italy

来源：

APPLIED PHYSICS LETTERS | 2000年 / 77卷 / 15期

关键词：

D O I：

10.1063/1.1317535

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We studied the microscopic kinetics of the amorphous-liquid interface in supercooled laser-melt silicon by means of molecular dynamics computer simulations. The interface velocity was obtained as a function of temperature by direct simulation of the interface motion in an amorphous-liquid model system. The temperature dependence of the kinetic prefactor was extracted from the interface velocity function and compared to the values of self-diffusivity obtained from independent molecular dynamics simulations of bulk amorphous Si. The kinetic prefactor for interfacial diffusion shows a distinctly non-Arrhenius behavior which is attributed to Fulcher-Vogel kinetics in the supercooled liquid. (C) 2000 American Institute of Physics. [S0003- 6951(00)04641-6].

引用

页码：2337 / 2339

页数：3

共 16 条

[1] PULSED MELTING OF SILICON (111) AND (100) SURFACES SIMULATED BY MOLECULAR-DYNAMICS [J].