Sputtered thin films of CuBr as electrochemical microsensors for NH3 gas:: structure, sensitivity and aging effects

被引：8

作者：

Lauque, P ^{[1
]}

Bendahan, M

Seguin, JL

Pasquinelli, M

Knauth, P

机构：

[1] Fac Sci Marseille St Jerome, Serv 152, Lab Electron & Physicochim Couches Minces, F-13397 Marseille 20, France

[2] Fac Sci Marseille St Jerome, Serv 231, Lab Defauts Semicond & Leurs Oxydes, F-13397 Marseille, France

[3] Univ Aix Marseille 1, Lab Physicochim Mat, F-13331 Marseille 3, France

来源：

SOLID STATE IONICS | 2000年 / 136卷

关键词：

copper halides; electrochemical detectors; sputtered thin films;

D O I：

10.1016/S0167-2738(00)00343-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Sputtered films of CuBr with inter-digitated copper electrodes are used as electrochemical detectors for NH, gas. The current-voltage characteristics are ohmic and depend on the NH, partial pressure, P, with a fast response. The quantitative relation between the resistivity change Delta rho and P is described by a Langmuir-type adsorption isotherm with an adsorption constant K = 12 mbar(-1). The square-root time dependence of rho is consistent with a diffusion-limited aging mechanism. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：603 / 606

页数：4

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