On the chaperon mechanism for association rate constants: The formation of HO2 and O-3

被引:53
作者
Varandas, AJC
Pais, AACC
Marques, JMC
Wang, W
机构
[1] Departamento de Química, Universidade de Coimbra, Coimbra
关键词
D O I
10.1016/0009-2614(95)01384-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report rate constants for the formation of HO2 and O-3 using the chaperon mechanism, and with Ar as scattering partner. The ArHO2 and ArO3 potential energy surfaces have been written as a pairwise summation of realistic EHFACE2-type potentials for interactions involving Ar and reliable global DMBE potential surfaces for chemically stable triatomic species. The calculations have been carried out using the quasiclassical trajectory approach.
引用
收藏
页码:264 / 271
页数:8
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