Adsorption of O-2 on Si(111)7x7 compared at 300 and 30K

被引：25

作者：

Comtet, G ^{[1
]}

Hellner, L ^{[1
]}

Dujardin, G ^{[1
]}

Ramage, MJ ^{[1
]}

机构：

[1] UNIV PARIS 11,PHOTOPHYS MOLEC LAB,CNRS,F-91405 ORSAY,FRANCE

来源：

SURFACE SCIENCE | 1996年 / 352卷

关键词：

chemisorption; oxygen; silicon; visible and ultraviolet photoelectron spectroscopy;

D O I：

10.1016/0039-6028(95)01154-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Adsorption of O-2 on Si(111) 7 X 7 at 30 K is studied by UV photoelectron spectroscopy and compared to previous results at 300 K. This demonstrates the existence of two distinct metastable states of O-2 adsorbed on Si(111)7 X 7. Furthermore, it is shown that the initial relative population of these metastable states depends on both the temperature and the O-2 coverage.

引用

页码：315 / 321

页数：7

共 24 条

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