Fabrication of high density dot lattices with electron beam lithography

被引：3

作者：

Stahlmecke, B ^{[1
]}

Dumpich, G ^{[1
]}

机构：

[1] Univ Duisburg Essen, Expt Phys AG Farle, D-47048 Duisburg, Germany

来源：

PHASE TRANSITIONS | 2005年 / 78卷 / 1-3期

关键词：

electron beam lithography; nanodot array;

D O I：

10.1080/01411590412331316717

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

We report the fabrication of large area (similar to5 mm(2)) magnetic dot arrays by electron beam lithography (EBL). After a standard spin on process the PMMA resist mask is exposed in a LEO 1530 scanning electron microscope (SEM) using the advanced SEM/FIB nanolithography System ELPHY plus from Raith. Different exposure modes have been tested to produce dots with minimal sizes and distances. Also, the time to produce a large area dot lattice has been minimized. Magnetic measurements on these dot lattices have been carried out using a SQUID magnetometer with a special sample holder. In this article we present details of the fabrication of the dot lattices and the first preliminary results concerning the magnetic properties of a lattice of dots with perpendicular magnetic anisotropy.

引用

页码：105 / 113

页数：9

共 13 条

[1]

[Anonymous], 2002, Magnetic nanostructures

[2] Magnetization reversal of nanostructured Co/Pt multilayer dots and films studied with magnetic force microscopy and MOKE [J].

Carl, A ;

Kirsch, S ;

Lohau, J ;

Weinforth, H ;

Wassermann, EF .

IEEE TRANSACTIONS ON MAGNETICS, 1999, 35 (05) :3106-3111

[3]

CULLITY BD, 1972, INTRO MAGNETIC MAT

[4] Fabrication of high-density nanostructures by electron beam lithography [J].

Dial, O ;

Cheng, CC ;

Scherer, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3887-3890

[5] REDUCTION AND ELIMINATION OF PROXIMITY EFFECTS [J].

DOBISZ, EA ;

MARRIAN, CRK ;

SALVINO, RE ;

ANCONA, MA ;

PERKINS, FK ;

TURNER, NH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2733-2740

[6] EVALUATION, VERIFICATION AND ERROR DETERMINATION OF PROXIMITY PARAMETERS ALPHA,BETA AND ETA IN ELECTRON-BEAM LITHOGRAPHY [J].

DUBONOS, SV ;

GAIFULLIN, BN ;

RAITH, HF ;

SVINTSOV, AA ;

ZAITSEV, SI .

MICROELECTRONIC ENGINEERING, 1993, 21 (1-4) :293-296

[7]

Edelstein A. S., 2001, Nanomaterials: Synthesis, Properties and Applications

[8]

Fendler J. H., 1998, NANOPARTICLES NANOST

[9]

KIRSCH S, 2003, THESIS U DUISBURG ES

[10] MAGNETIC AND STRUCTURAL-PROPERTIES OF CO/PT MULTILAYERS [J].

LIN, CJ ;

GORMAN, GL ;

LEE, CH ;

FARROW, RFC ;

MARINERO, EE ;

DO, HV ;

NOTARYS, H ;

CHIEN, CJ .

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1991, 93 :194-206

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