Morphology of ultrathin supported diblock copolymer films: Theory and experiment

被引:209
作者
Fasolka, MJ
Banerjee, P
Mayes, AM [1 ]
Pickett, G
Balazs, AC
机构
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[2] Univ Pittsburgh, Dept Chem & Petr Engn, Pittsburgh, PA 15620 USA
关键词
D O I
10.1021/ma990021h
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
An analysis of the morphological behavior of substrate-supported diblock copolymer films for thicknesses t below the equilibrium period L-0 of the copolymer is presented. Substrate-supported films generally exhibit dissimilar interactions between the copolymer block components and the free and Substrate surfaces. Accordingly, in this study, self-consistent-field calculations that incorporate asymmetric surface energetics were used to assess equilibrium film morphologies. Phase diagrams were constructed as a function of film thickness, surface interaction energies, the segmental interaction, and the chain length. In conjunction, experiments were conducted on a series of polystyrene-b-poly(n-alkyl methacrylate) copolymer films supported by silicon substrates. These employed a novel atomic force microscopy technique that allowed for the precise tracking of morphology as a function of film thickness. Comparison of the experimental results and calculations revealed several common trends. In particular, hybrid morphologies, incorporating both surface-parallel and surface-perpendicular elements, were observed both experimentally and through the calculations for the thickness regime, t similar to 0.5L(0). The stability of such structures was found to be closely linked to the symmetry of the surface energetics.
引用
收藏
页码:5702 / 5712
页数:11
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