Investigation on reversed domain structures in lithium niobate crystals patterned by interference lithography

被引：51

作者：

Grilli, S

Ferraro, P

De Nicola, S

Finizio, A

Pierattini, G

De Natale, P

Chiarini, M

机构：

[1] CNR, Sez Napoli, Ist Nazl Ott Applicata, Ist Cibernet E Caianiello, I-80078 Pozzuoli, NA, Italy

[2] CNR, IMM, Sez Napoli, I-80131 Naples, Italy

[3] CNR E Caianiello, Ist Cibernet, I-80078 Pozzuoli, NA, Italy

[4] Ist Nazl Ott Applicata, I-50125 Florence, Italy

[5] CNR, IMM, Sez Bologna, I-40129 Bologna, Italy

来源：

OPTICS EXPRESS | 2003年 / 11卷 / 04期

关键词：

D O I：

10.1364/OE.11.000392

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate fabrication of periodically poled lithium niobate samples by electric field poling, after patterning by interference lithography. Furthermore we investigate the poling process at an overpoling regime which caused the appearance of submicron dot domains very similar to those induced by backswitch but different in nature. We show the possibility for realizing submicron-scaled three-dimensional domain patterns that could be applied to the construction of photonic crystals and in nonlinear optics. We show that high etch-rate applied to such structures allows to obtain pyramidal-like submicron relief structures which in principle could find application for waveguide construction in photonic bandgap devices. (C) 2003 Optical Society of America.

引用

页码：392 / 405

页数：14

共 28 条

[1]

Barry I. E., 2000, THESIS U SOUTHAMPTON

[2] Microstructuring of lithium niobate using differential etch-rate between inverted and non-inverted ferroelectric domains [J].