Microstructuring of lithium niobate single crystals using pulsed UV laser modification of etching characteristics

被引：14

作者：

Brown, PT

Mailis, S

Zergioti, I

Eason, RW ^{[1
]}

机构：

[1] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England

[2] FORTH IESL, Laser & Applicat Div, Iraklion 71110, Crete, Greece

来源：

OPTICAL MATERIALS | 2002年 / 20卷 / 02期

关键词：

lithium niobate; etching frustration; laser ablation; microstructuring; UV irradiation;

D O I：

10.1016/S0925-3467(02)00058-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report a modification in the etching characteristics of lithium niobate (LiNbO3) single crystals induced by irradiating the crystal surface with pulsed UV laser light at fluences just below the ablation threshold. Modified etching behaviour has been observed using 248, 308 and 355 nm light from excimers and frequency tripled YAG lasers, for x-cut and z-cut surfaces. Both etch enhancement and etch frustration has been observed, depending on the choice of irradiation conditions. The maximum depth of surface relief structures achieved so far is >2 mum for the -z face, using etching frustration. The potential applications for micro structuring LiNbO3 using these modified etching techniques are also discussed. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：125 / 134

页数：10

共 11 条

[1] Microstructuring of lithium niobate using differential etch-rate between inverted and non-inverted ferroelectric domains [J].