Radiation damage of poly(methylmethacrylate) thin films analyzed by UPS

被引：32

作者：

Okudaira, KK

Morikawa, E ^{[1
]}

Hasegawa, S

Sprunger, PT

Saile, V

Seki, K

Harada, Y

Ueno, N

机构：

[1] Louisiana State Univ, J Bennett Johnston Sr, Ctr Adv Microstruct & Devices, Baton Rouge, LA 70803 USA

[2] Nagoya Univ, Grad Sch Sci, Dept Chem, Chikusa Ku, Nagoya, Aichi 46401, Japan

[3] Chiba Univ, Fac Engn, Dept Mat Sci, Inage Ku, Chiba 263, Japan

[4] Inst Mol Sci, Okazaki, Aichi 444, Japan

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1998年 / 88卷

关键词：

PMMA; UPS; radiation damage; MO calculation;

D O I：

10.1016/S0368-2048(97)00219-3

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

Radiation damage of poly(methylmethacrylate) (PMMA) caused by vacuum ultraviolet monochromatic synchrotron radiation was studied by ultraviolet photoelectron spectroscopy. An independent atomic center approximation combined with molecular orbital calculation was employed to study the radiation damage of PMMA quantitatively for the first time. The results of the analysis indicate that main photodegradation is ascribed to abstraction of ester groups and formation of double bonds in the polymer chain. (C) 1998 Elsevier Science B.V.

引用

页码：913 / 917

页数：5

共 8 条

[1] ANGLE-RESOLVED PHOTOEMISSION FROM MOLECULES IN INDEPENDENT-ATOMIC-CENTER APPROXIMATION [J].