Atomic scale studies of silver segregation at {222}MgO/Cu heterophase interfaces

被引:5
作者
Shashkov, DA [1 ]
Seidman, DN [1 ]
机构
[1] NORTHWESTERN UNIV,MAT RES CTR,EVANSTON,IL 60208
来源
INTERGRANULAR AND INTERPHASE BOUNDARIES IN MATERIALS, PT 1 | 1996年 / 207-卷
关键词
Cu/MgO; internal oxidation; precipitate; ceramic/metal interface; atom-probe field-ion microscopy; equilibrium segregation; Gibbsian interfacial excess;
D O I
10.4028/www.scientific.net/MSF.207-209.429
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Atom-probe field-ion microscopy (APFIM) was used to measure quantitatively the absolute values of the Gibbsian interfacial excess of Ag, Gamma(Ag), at semi-coherent {222} MgO/Cu(Ag) heterophase interfaces. Atomically clean metal oxide/metal heterophase interfaces were obtained by internal oxidation of a pure ternary Cu(Mg, Ag) single-phase alloy to produce octahedral-shaped MgO precipitates, 10 to 30 nm in diameter and faceted on {222} panes, in a single-phase Cu(Ag) matrix. The measured value of Gamma(Ag), at 500 degrees C is (2+/-0.6)x10(15) atoms cm(-2).
引用
收藏
页码:429 / 432
页数:4
相关论文
共 21 条
[1]   COARSENING BEHAVIOUR OF THETA'' AND THETA' PRECIPITATES IN 2 AL-CU ALLOYS [J].
BOYD, JD ;
NICHOLSON, RB .
ACTA METALLURGICA, 1971, 19 (12) :1379-+
[2]   CHEMISTRY AND STRUCTURE OF CDO/AG(222) HETEROPHASE INTERFACES [J].
CHAN, DK ;
SEIDMAN, DN ;
MERKLE, KL .
PHYSICAL REVIEW LETTERS, 1995, 75 (06) :1118-1121
[3]   HIGH-RESOLUTION ELECTRON-MICROSCOPY OF CU/MGO AND PD/MGO INTERFACES [J].
CHEN, FR ;
CHIOU, SK ;
CHANG, L ;
HONG, CS .
ULTRAMICROSCOPY, 1994, 54 (2-4) :179-191
[4]   THE INFLUENCE OF INTERFACE IMPURITIES ON FRACTURE ENERGY OF UHV DIFFUSION-BONDED METAL-CERAMIC BICRYSTALS [J].
ELSSNER, G ;
KORN, D ;
RUHLE, M .
SCRIPTA METALLURGICA ET MATERIALIA, 1994, 31 (08) :1037-1042
[5]   THE FRACTURE-RESISTANCE OF METAL CERAMIC INTERFACES [J].
EVANS, AG ;
DALGLEISH, BJ .
ACTA METALLURGICA ET MATERIALIA, 1992, 40 :S295-S306
[6]   SULFUR SEGREGATION DURING THE HIGH-TEMPERATURE OXIDATION OF CHROMIUM [J].
FOX, P ;
LEES, DG ;
LORIMER, GW .
OXIDATION OF METALS, 1991, 36 (5-6) :491-503
[7]   COMPUTER-CONTROLLED TIME-OF-FLIGHT ATOM-PROBE FIELD-ION MICROSCOPE FOR STUDY OF DEFECTS IN METALS [J].
HALL, TM ;
WAGNER, A ;
SEIDMAN, DN .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1977, 10 (09) :884-893
[8]  
Hayes P., 1975, Metal Science, V9, P332, DOI 10.1179/030634575790444775
[9]   OXIDE SCALE ADHESION AND IMPURITY SEGREGATION AT THE SCALE METAL INTERFACE [J].
HOU, PY ;
STRINGER, J .
OXIDATION OF METALS, 1992, 38 (5-6) :323-345
[10]  
Jang H., 1993, Interface Science, V1, P61, DOI 10.1007/BF00203266