Low-cost X-ray conformal mask using dry film resist

被引：9

作者：

Shih, WP ^{[1
]}

Cheng, Y

Lin, CY

Hwang, GJ

机构：

[1] Natl Tsing Hua Univ, Dept Power Mech Engn, Hsinchu 30043, Taiwan

[2] Synchrotron Radiat Res Ctr, Hsinchu 30077, Taiwan

来源：

MICROELECTRONIC ENGINEERING | 1998年 / 40卷 / 01期

关键词：

X-ray mask; X-ray lithography; LIGA technology; dry film;

D O I：

10.1016/S0167-9317(97)00190-1

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A economical X-ray conformal mask manufactured by using a dry film process is reported. The dry film (HITACHI H-N650) is used as the photoresist in the photolithography process. Tin/lead and gold were electroplated as the X-ray absorber. The feasibility and limitations of the dry film process were addressed. Using this X-ray conformal mask in X-ray lithography, 1000 mu m thick PMMA microstructures were achieved to demonstrate the fidelity of this method.

引用

页码：43 / 50

页数：8

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