Observation of high-aspect-ratio nanostructures using capillary lithography

被引：37

作者：

Suh, KY ^{[1
]}

Choi, SJ

Baek, SJ

Kim, TW

Langer, R

机构：

[1] Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea

[2] Minuta Tech, Ctr Biotechnol Incubating, Seoul 151742, South Korea

[3] MIT, Dept Chem Engn, Cambridge, MA 02139 USA

[4] MIT, Div Biol Engn, Cambridge, MA 02139 USA

来源：

ADVANCED MATERIALS | 2005年 / 17卷 / 05期

关键词：

D O I：

10.1002/adma.200401089

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Several intriguing nanostructures, such as mushroom-like nanopillars, vertical nanopillars (see Figure), and nanospheres, are made using capillary lithography and a new, UV-curable mold consisting of polyurethane functionalized with an acrylate group. An aspect ratio as high as five is achieved for nanopillars 90 nm in diameter.

引用

页码：560 / +

页数：6

共 32 条

[1] Conformal contact and pattern stability of stamps used for soft lithography [J].

Bietsch, A ;

Michel, B .

JOURNAL OF APPLIED PHYSICS, 2000, 88 (07) :4310-4318

[2]

Brandup J., 1989, Polymer Handbook, V3rd ed.

[3]

Cheng JY, 2001, ADV MATER, V13, P1174, DOI 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO

[4]

2-Q

[5] A photocurable poly(dimethylsiloxane) chemistry designed for soft lithographic molding and printing in the nanometer regime [J].

Choi, KM ;

Rogers, JA .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (14) :4060-4061

[6] An ultraviolet-curable mold for sub-100-nm lithography [J].

Choi, SJ ;

Yoo, PJ ;

Baek, SJ ;

Kim, TW ;

Lee, HH .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2004, 126 (25) :7744-7745

[7] Imprint lithography with 25-nanometer resolution [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

SCIENCE, 1996, 272 (5258) :85-87

[8] Microcontact printing of macromolecules with submicrometer resolution by means of polyolefin stamps [J].

Csucs, G ;

Künzler, T ;

Feldman, K ;

Robin, F ;

Spencer, ND .

LANGMUIR, 2003, 19 (15) :6104-6109

[9] Stability of molded polydimethylsiloxane microstructures [J].

Delamarche, E ;

Schmid, H ;

Michel, B ;

Biebuyck, H .

ADVANCED MATERIALS, 1997, 9 (09) :741-746

[10] A nanoscale optical blosensor: Sensitivity and selectivity of an approach based on the localized surface plasmon resonance spectroscopy of triangular silver nanoparticles [J].

Haes, AJ ;

Van Duyne, RP .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2002, 124 (35) :10596-10604

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