Observation of high-aspect-ratio nanostructures using capillary lithography

被引：37

作者：

Suh, KY ^{[1
]}

Choi, SJ

Baek, SJ

Kim, TW

Langer, R

机构：

[1] Seoul Natl Univ, Sch Mech & Aerosp Engn, Seoul 151742, South Korea

[2] Minuta Tech, Ctr Biotechnol Incubating, Seoul 151742, South Korea

[3] MIT, Dept Chem Engn, Cambridge, MA 02139 USA

[4] MIT, Div Biol Engn, Cambridge, MA 02139 USA

来源：

ADVANCED MATERIALS | 2005年 / 17卷 / 05期

关键词：

D O I：

10.1002/adma.200401089

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Several intriguing nanostructures, such as mushroom-like nanopillars, vertical nanopillars (see Figure), and nanospheres, are made using capillary lithography and a new, UV-curable mold consisting of polyurethane functionalized with an acrylate group. An aspect ratio as high as five is achieved for nanopillars 90 nm in diameter.

引用

页码：560 / +

页数：6

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