Fabrication of metallic probes by a new technology based on double molding

被引：7

作者：

Beuret, C

Niedermann, P

Staufer, U

de Rooij, NF

机构：

[1] Univ Neuchatel, Inst Microtechnol, CH-2007 Neuchatel, Switzerland

[2] Ctr Suisse Elect & Microtech SA, CH-2007 Neuchatel, Switzerland

来源：

MICROELECTRONIC ENGINEERING | 1998年 / 42卷

关键词：

D O I：

10.1016/S0167-9317(98)00127-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Sharp metal tips are needed for both vacuum microelectronics and metrology purposes such as potentiometry. A small tip radius, a slender but rigid cone and an inert surface are required for both applications. The new microfabrication process fulfills these needs and allows, moreover, a mass production of identical tips. It is based on a double mold of an anisotropically etched silicon tip. In principle, all sorts of metal tips can be fabricated with this technique.

引用

页码：543 / 546

页数：4

共 11 条

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