Self-assembly of block copolymers in thin films

被引：101

作者：

Matsen, MW ^{[1
]}

机构：

[1] Univ Reading, Ctr Polymer Sci, Reading RG6 6AF, Berks, England

来源：

CURRENT OPINION IN COLLOID & INTERFACE SCIENCE | 1998年 / 3卷 / 01期

关键词：

D O I：

10.1016/S1359-0294(98)80040-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Block copolymers are recognized for their tendency to form well-ordered periodic microstructures, often with exceptionally intricate geometries. This class of molecule now promises to provide important commercial applications in the form of thin films. There have been many recent advances in the effort to create confined films, control surface potentials, probe and manipulate morphology, explain equilibrium behaviour, and understand kinetics. Such advances will be crucial in the development of applications for block copolymer films such as surface coatings, porous membranes, waveguides, and nanoscale templates.

引用

页码：40 / 47

页数：8

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