Benchtop fabrication of submicrometer metal line and island Arrays using passivative microcontact printing and electroless plating

被引：32

作者：

Moran, CE

Radloff, C

Halas, NJ

机构：

[1] Rice Univ, Dept Chem, Houston, TX 77005 USA

[2] Rice Univ, Dept Elect & Comp Engn, Houston, TX 77005 USA

来源：

ADVANCED MATERIALS | 2003年 / 15卷 / 10期

关键词：

D O I：

10.1002/adma.200304507

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

An entirely benchtop method of fabricating long-range, planar arrays of discrete metal structures on glass or SiO2/Si surfaces without the use of e-beam or photolithography, resist masks, or chemical etching is reported. This approach combines microcontact printing and directed electroless plating for the controlled deposition of islands or lines of gold or silver. The Figure shows gold lines ca. 50 nm in height deposited on a pre-patterned glass surface.

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页码：804 / +

页数：5

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