Development of contact scanning probe lithography methods for the fabrication of lateral nano-dimensional elements

被引：12

作者：

Dryakhlushin, VF ^{[1
]}

Klimov, AY ^{[1
]}

Rogov, VV ^{[1
]}

Shashkin, VI ^{[1
]}

Sukhodoev, LV ^{[1
]}

Volgunov, DG ^{[1
]}

Vostokov, NV ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 603600, Russia

来源：

NANOTECHNOLOGY | 2000年 / 11卷 / 03期

关键词：

D O I：

10.1088/0957-4484/11/3/309

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A method of contact scanning probe lithography has been developed to enable fabrication of elements with characteristic dimensions of about 50 nm. The method involves deposition of a thin-film two-layer polymer-metal mask coating, mechanical or thermal nonplastic deformation of the top metal layer with a probe microscope, the transfer of the pattern through the polymer by means of dry etching and the formation of various nanoelements through this prepared mask. The method is applicable to any materials relevant to the formation of different nanometre objects-both metal and dielectric-on their surface.

引用

页码：188 / 191

页数：4

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