Photooxidation of arylmethyl bromides with mesoporous silica FSM-16

被引：36

作者：

Itoh, A

Kodama, T

Inagaki, S

Masaki, Y

机构：

[1] Gifu Pharmaceut Univ, Gifu 5028585, Japan

[2] Toyota Cent Res & Dev Labs Inc, Aichi 4801192, Japan

来源：

ORGANIC LETTERS | 2000年 / 2卷 / 16期

关键词：

D O I：

10.1021/ol0061081

中图分类号：

O62 [有机化学];

学科分类号：

070303 ; 081704 ;

摘要：

[GRAPHICS] A mesoporous silica FSM-16 was found to be a recyclable oxidizing promoter of arylmethyl bromides for the preparation the corresponding carboxylic acids, aldehydes, or ketones under photoirradiation conditions.

引用

页码：2455 / 2457

页数：3

共 18 条

[1] Solvatochromic linear solvation energy relationships for solubility of O2 in various solvents
Che, Y
Tokuda, K
Ohsaka, T
[J]. BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1998, 71 (03) : 651 - 656
[2] CLANDERMAN BH, 1966, J ORG CHEM, V31, P2618
[3] DIMETHYL DULFOXIDE OXIDATIONS
EPSTEIN, WW
SWEAT, FW
[J]. CHEMICAL REVIEWS, 1967, 67 (03) : 247 - &
[4] Syntheses of highly ordered mesoporous materials, FSM-16, derived from kanemite
Inagaki, S
Koiwai, A
Suzuki, N
Fukushima, Y
Kuroda, K
[J]. BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1996, 69 (05) : 1449 - 1457
[5] SYNTHESIS OF HIGHLY ORDERED MESOPOROUS MATERIALS FROM A LAYERED POLYSILICATE
INAGAKI, S
FUKUSHIMA, Y
KURODA, K
[J]. JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS, 1993, (08) : 680 - 682
[6] Oxidative photodecarboxylation of α-hydroxycarboxylic acids and phenylacetic acid derivatives with FSM-16
Itoh, A
Kodama, T
Inagaki, S
Masaki, Y
[J]. ORGANIC LETTERS, 2000, 2 (03) : 331 - 333
[7] Itoh A, 1999, SYNLETT, P357
[8] Selective acceleration for deprotection of benzyl ethers with Ti-HMS
Itoh, A
Kodama, T
Maeda, S
Masaki, Y
[J]. TETRAHEDRON LETTERS, 1998, 39 (51) : 9461 - 9464
[9] New synthetic method of imides through oxidative photodecarboxylation reaction of N-protected α-amino acids with FSM-16
Itoh, A
Kodama, T
Inagaki, S
Masaki, Y
[J]. CHEMISTRY LETTERS, 2000, (05) : 542 - 543
[10] ITOH A, UNPUB

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