Imaging of atomic oxygen in a microwave excited oxygen plasma with two-dimensional optical emission spectroscopy

被引:12
作者
Behle, S [1 ]
Georg, A [1 ]
Yuan, Y [1 ]
Engemann, J [1 ]
Brockhaus, A [1 ]
机构
[1] Univ Wuppertal, Forschungszentrum Mikrostrukturtech Fmt, D-42287 Wuppertal, Germany
关键词
microwave discharge; oxygen plasma; planar optical emission spectroscopy; LIF; SLAN;
D O I
10.1016/S0257-8972(97)00169-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The density distribution of atomic oxygen was investigated in a pure oxygen microwave discharge. Plasma is excited by use of a circular waveguide with slot antenna. Two-dimensional maps of the O((3)p P-3) to O(3s S-3(0)) emission line intensity have been obtained using planar optical emission spectroscopy imaging (FOES). The dependence on operating parameters of the plasma source has been studied. With increasing pressure the atomic oxygen homogeneity degrades. At pressures below 20 Pa the oxygen density is nearly homogeneous due to the greater diffusion length. Absolute ground state concentration of atomic oxygen has been measured at a downstream position by two-photon laser-induced fluorescence (LIF). Values in the range of 10(13)-10(14) cm(-3) are obtained. Comparing FOES to LIF results the POPS signals must be corrected for line-of-sight path integration. If this is taken into account then LIF and FOES measurements show a good correlation between atomic ground state and excited oxygen for pressures up to 50 Pa. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:734 / 741
页数:8
相关论文
共 21 条
[1]   2-PHOTON-EXCITED STIMULATED-EMISSION FROM ATOMIC OXYGEN IN FLAMES AND COLD GASES [J].
ALDEN, M ;
WESTBLOM, U ;
GOLDSMITH, JEM .
OPTICS LETTERS, 1989, 14 (06) :305-307
[2]   2-PHOTON LASER-INDUCED FLUORESCENCE AND AMPLIFIED SPONTANEOUS EMISSION ATOM CONCENTRATION MEASUREMENTS IN O(2) AND H(2) DISCHARGES [J].
AMORIM, J ;
BARAVIAN, G ;
TOUZEAU, M ;
JOLLY, J .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (03) :1487-1493
[3]   ABSOLUTE 2-PHOTON ABSORPTION AND 3-PHOTON IONIZATION CROSS-SECTIONS FOR ATOMIC OXYGEN [J].
BAMFORD, DJ ;
JUSINSKI, LE ;
BISCHEL, WK .
PHYSICAL REVIEW A, 1986, 34 (01) :185-198
[4]   2-PHOTON LASER-INDUCED FLUORESCENCE IN OXYGEN AND NITROGEN-ATOMS [J].
BISCHEL, WK ;
PERRY, BE ;
CROSLEY, DR .
CHEMICAL PHYSICS LETTERS, 1981, 82 (01) :85-88
[5]   ABSOLUTE CALIBRATION OF A FLUORESCENCE COLLECTION SYSTEM BY RAMAN-SCATTERING IN H-2 [J].
BISCHEL, WK ;
BAMFORD, DJ ;
JUSINSKI, LE .
APPLIED OPTICS, 1986, 25 (07) :1215-1221
[6]   Determination of chemically active species in a novel microwave plasma source by laser-induced fluorescence [J].
Brockhaus, A ;
Yuan, Y ;
Behle, S ;
Engemann, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (03) :1882-1887
[7]   CHARACTERIZATION OF A MICROWAVE PLASMA BY IN-SITU DIAGNOSTICS [J].
BROCKHAUS, A ;
KORZEC, D ;
WERNER, F ;
YUAN, Y ;
ENGEMANN, J .
SURFACE & COATINGS TECHNOLOGY, 1995, 74-5 (1-3) :431-442
[8]   ON THE ROLE OF ATOMIC OXYGEN IN THE ETCHING OF ORGANIC POLYMERS IN A RADIOFREQUENCY OXYGEN DISCHARGE [J].
COLLART, EJH ;
BAGGERMAN, JAG ;
VISSER, RJ .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (01) :47-54
[9]   EXCITATION MECHANISMS OF OXYGEN-ATOMS IN A LOW-PRESSURE O-2 RADIOFREQUENCY PLASMA [J].
COLLART, EJH ;
BAGGERMAN, JAG ;
VISSER, RJ .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (10) :5278-5281
[10]   OPTICAL DIAGNOSTICS OF LOW-PRESSURE PLASMAS [J].
DREYFUS, RW ;
JASINSKI, JM ;
WALKUP, RE ;
SELWYN, GS .
PURE AND APPLIED CHEMISTRY, 1985, 57 (09) :1265-1276