Correlation between atomic structure and localized gap states in silicon grain boundaries

被引:37
作者
Cleri, F
Keblinski, P
Colombo, L
Phillpot, SR
Wolf, D
机构
[1] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA
[2] ENEA, Ctr Ric Casaccia, Div Mat Avanzati, I-00100 Rome, Italy
[3] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA
[4] Univ Milan, Dipartimento Sci Mat, I-20126 Milan, Italy
[5] INFM, I-20126 Milan, Italy
来源
PHYSICAL REVIEW B | 1998年 / 57卷 / 11期
关键词
D O I
10.1103/PhysRevB.57.6247
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tight-binding molecular-dynamics simulations of a typical high-energy grain boundary in silicon show that its equilibrium atomic structure is similar to that of bulk amorphous silicon and contains coordination defects. The corresponding electronic structure is also amorphouslike, displaying gap states mainly localized around the coordination defects, where large changes in the bond-hybridization character are observed. It is proposed that such coordination defects in disordered high-energy grain boundaries are responsible for the experimentally observed gap states in polycrystalline Si.
引用
收藏
页码:6247 / 6250
页数:4
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