Optical characterization of low optical thickness thin films from transmittance and back reflectance measurements

被引：70

作者：

Laaziz, Y

Bennouna, A

Chahboun, N

Outzourhit, A

Ameziane, EL

机构：

[1] LPSCM, Fac Sci Semlalia, Dept Phys, Marrakech 40000, Morocco

[2] Ecole Natl Sci Apliquees Tanger, Tanger, Morocco

来源：

THIN SOLID FILMS | 2000年 / 372卷 / 1-2期

关键词：

thin films; thickness; transmittance; reflectance;

D O I：

10.1016/S0040-6090(00)00997-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this work a method for the determination of the thickness and optical properties of low optical thickness films (D < 600 nm), from the experimental transmittance (T) and back reflectance (R') measurements, is proposed. An original analytical formulation without any kind of approximation is employed for the computations. The computing algorithm is presented in detail and an error study is given. The method is applied for the characterization of sputtered CdTe and a-Si thin films of optical thickness in the range of 250 nm. (C) 2000 Elsevier Science S.A. All rights reserved.

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收藏

页码：149 / 155

页数：7

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