Very low thermal expansion in TaO2F

被引:53
作者
Tao, JZ [1 ]
Sleight, AW [1 ]
机构
[1] Oregon State Univ, Dept Chem, Corvallis, OR 97331 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/S0022-4596(03)00077-X
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
X-ray diffraction data for TaO2F from 20 to 400 K show a thermal expansion so low that we cannot be certain whether it is positive or negative. We estimate the absolute value of the thermal expansion coefficient to be less than 6 x 10(-7)/K. This then is comparable to that of amorphous SiO2, and is apparently unique behavior for a cubic material over such a large temperature range. (C) 2003 Elsevier Science (USA). All rights reserved.
引用
收藏
页码:45 / 48
页数:4
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