Electron transport in wurtzite indium nitride

被引:282
作者
O'Leary, SK [1 ]
Foutz, BE
Shur, MS
Bhapkar, UV
Eastman, LF
机构
[1] Rensselaer Polytech Inst, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA
[2] Cornell Univ, Sch Elect Engn, Ithaca, NY 14853 USA
[3] USN, Ctr Surface Warfare, Dahlgren, VA 22448 USA
关键词
D O I
10.1063/1.366641
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present the velocity-field characteristics of wurtzite indium nitride, determined using an ensemble Monte Carlo approach. It is found that indium nitride exhibits an extremely high peak drift velocity at room temperature, 4.3 X 10(7) cm/s, at a doping concentration of 1.0 X 10(17) cm(-3). We also demonstrate that the saturation drift velocity of indium nitride, 2.5 X 10(7) cm/s, is comparable to that of gallium nitride, and much larger than that of gallium arsenide. Our results suggest that the transport characteristics of indium nitride are superior to those of gallium nitride and gallium arsenide, over a wide range of temperatures, from 150 to 500 K, and doping concentrations, up to 1.0 X 10(19) cm(-3). Hence, indium nitride has considerable potential for device applications. (C) 1998 American Institute of Physics. [S0021-8979(98)02202-6].
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页码:826 / 829
页数:4
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