Reaction mechanisms in both a CCl2F2/O2/Ar and a CCl2F2/H2/Ar RF plasma environment

被引:17
作者
Wang, YF
Lee, WJ [1 ]
Chen, CY
Wu, YPG
Chang-Chien, GP
机构
[1] Natl Cheng Kung Univ, Dept Environm Engn, Tainan 701, Taiwan
[2] Natl Cheng Kung Univ, Dept Chem Engn, Tainan 701, Taiwan
[3] Natl Ilan Inst, Dept Chem Engn, Ilan 26011, Taiwan
[4] Cheng Shiu Inst Technol, Dept Chem Engn, Kaohsiung 833, Taiwan
关键词
dichlorodifluoromethane (CCl2F2); plasma system; radiofrequency; reaction mechanism;
D O I
10.1023/A:1007027805680
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Decomposition of dichlorodifluoromethane (CCl2F2 or CFC-12) in a radiofrequency) (RF) plasma system is demonstrated. The CCl2F2 decomposition fractions (eta (CCl2F2)) and mole fractions of detected products in the effluent gas stream of CCl2F2/O-2/Ar and CCl2F2/H-2/Ar plasma, respectively: have been determined. The experimental parameters including input power wattage, O-2/CCl2F2 Or H-2/ CCl2F2 ratio, operational pressure, and CCl2F2 feeding concentration were investigated The main carbonaceous product in the CCl2F2/O-2/Ar plasma system was CO2, while that in the CCl2F2/H-2/Ar plasma system was CH4 and C2H2. Furthermore, the possible reaction pathways were built-up and elucidated in this study. The results of the experiments showed that the highly, electronegative chlorine and fluorine could easily separate from the CCl2F2 molecule and combine with the added reaction gas. This led to the reactions terminated with the CO2, CH4, and C2H2 formation, because of their high bonding strength. The addition of hydrogen would form a preferential pathway for the HCl and HF formations, which were thermodynamically stable diatomic species that would limit the production of CCl3F, CClF3, CF4, and CCl4. In addition, the HCl and HF could be removed by neutral or scrubber method. Hence, a hydrogen-based RF plasma system provided a better alternative to decompose CCl2F2.
引用
收藏
页码:469 / 494
页数:26
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