Electronically induced instability of a hydrogen-carbon complex in silicon and its dissociation mechanism

被引:23
作者
Kamiura, Y [1 ]
Hayashi, M [1 ]
Nishiyama, Y [1 ]
Ohyama, S [1 ]
Yamashita, Y [1 ]
机构
[1] Okayama Univ, Fac Engn, Okayama 700, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 11期
关键词
defect; hydrogen; carbon; silicon; stability; dissociation; photoexcitation; DLTS;
D O I
10.1143/JJAP.36.6579
中图分类号
O59 [应用物理学];
学科分类号
摘要
We studied, by deep-level transient spectroscopy (DLTS), the dissociation mechanism of a hydrogen-carbon (H-C) complex, which has a donor level at E-c - 0.15 eV and acts as an electron trap in crystalline silicon. On the basis of our results and a previously proposed atomic model of the H-C complex, in which the hydrogen atom resides inside a silicon-carbon bond, we have proposed the following dissociation mechanism. The complex is stable in the positive charge state, and to dissociate it needs a hydrogen jump with an activation energy of 1.3 eV to break the bond with carbon and silicon. The complex becomes neutral by capturing an electron from the conduction band or accepting an electron directly from the valence band under electronic excitation, and is consequently dissociated at an activation energy of 0.5eV due to the loss of binding. Strong evidence for the existence of the negative charge state of hydrogen in crystalline silicon is also presented.
引用
收藏
页码:6579 / 6591
页数:13
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