Chemical vapor deposition of nickel oxide films from bis-π-cyclopentadienyl-nickel

被引：63

作者：

Yeh, WC ^{[1
]}

Matsumura, M ^{[1
]}

机构：

[1] Tokyo Inst Technol, Fac Engn, Dept Phys Elect, Meguro Ku, Tokyo 152, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 11期

关键词：

bis-pi-cyclopentadienyl nickel; nickelocene; chemical vapor deposition; electrochromic devices; transparent conducting films; antiferromagnetic layer;

D O I：

10.1143/JJAP.36.6884

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Bis-pi-cyclopentadienyl nickel has been proposed as a source material for metalorganic chemical vapor deposition of nickel oxide films. The transparent film deposited at 310 degrees C was of a NaCl-type crystal structure of NiO. The refractive index and optical bandgap were approximately 2.1 and 3.7 eV, respectively.

引用

页码：6884 / 6887

页数：4

共 16 条

[1] EFFECT OF DEPOSITION PRESSURE ON THE MICROSTRUCTURE AND ELECTROCHROMIC PROPERTIES OF ELECTRON-BEAM-EVAPORATED NICKEL-OXIDE FILMS [J].

AGRAWAL, A ;

HABIBI, HR ;

AGRAWAL, RK ;

CRONIN, JP ;

ROBERTS, DM ;

CARONPOPOWICH, R ;

LAMPERT, CM .

THIN SOLID FILMS, 1992, 221 (1-2) :239-253

[2] COO-NIO SUPERLATTICES - INTERLAYER INTERACTIONS AND EXCHANGE-ANISOTROPY WITH NI81FE19 [J].

CAREY, MJ ;

BERKOWITZ, AE .

JOURNAL OF APPLIED PHYSICS, 1993, 73 (10) :6892-6897

[3] Preferred orientations of NiO films prepared by plasma-enhanced metalorganic chemical vapor deposition [J].

Fujii, E ;

Tomozawa, A ;

Torii, H ;

Takayama, R .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1996, 35 (3A) :L328-L330

[4]

FUJIKI T, 1973, Patent No. 21093

[5] INFRARED SURFACE MODES IN SMALL NIO PARTICLES [J].

HUNT, AJ ;

STEYER, TR ;

HUFFMAN, DR .

SURFACE SCIENCE, 1973, 36 (02) :454-461

[6]

JOLLY PW, 1974, ORGANO CHEM NICKEL, V2, P420

[7] X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES OF NICKEL-OXYGEN SURFACES USING OXYGEN AND ARGON ION-BOMBARDMENT [J].

KIM, KS ;

WINOGRAD, N .

SURFACE SCIENCE, 1974, 43 (02) :625-643

[8] Preparation and characteristics of nickel oxide thin film by controlled growth with sequential surface chemical reactions [J].

Kumagai, H ;

Matsumoto, M ;

Toyoda, K ;

Obara, M .

JOURNAL OF MATERIALS SCIENCE LETTERS, 1996, 15 (12) :1081-1083

[9] THE ELECTROCHROMIC PROPERTIES OF NICKEL-OXIDE THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION [J].

MARUYAMA, T ;

ARAI, S .

SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1993, 30 (03) :257-262

[10] OPTICAL PROPERTIES OF NIO AND COO [J].

POWELL, RJ ;

SPICER, WE .

PHYSICAL REVIEW B-SOLID STATE, 1970, 2 (06) :2182-+

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