Surface band bending, nitrogen-vacancy-related defects, and 2.8-eV photoluminescence band of (NH4)2Sx-treated p-GaN

被引:21
作者
Lin, YJ [1 ]
Wang, ZL
Chang, HC
机构
[1] Feng Chia Univ, Dept Elect Engn, Taichung 40724, Taiwan
[2] Feng Chia Univ, Dept Automat Control Engn, Taichung 40724, Taiwan
关键词
D O I
10.1063/1.1533857
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have employed the photoluminescence and x-ray photoelectron spectroscopy measurements to study the effects of (NH4)(2)S-x treatment on the p-type GaN (p-GaN). After (NH4)(2)S-x treatment, we found. that the reduction of the surface state, related to nitrogen-vacancy defects on the p-GaN surface, led to a reduction in surface band bending by 0.25 eV. The surface band bending reduction and surface state reduction, caused by the (NH4)(2)S-x surface treatment could be useful for the formation of ohmic and Schottky contacts between the metal and p-GaN layers. In addition, the intensity of the 2.8-eV photoluminescence band depended on the amount of nitrogen vacancy of p-GaN, which was also investigated in this study. (C) 2002 American Institute of Physics. [DOI: 10.1063/1.4533857].
引用
收藏
页码:5183 / 5185
页数:3
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