Surface oxidation of liquid Sn

被引：18

作者：

Grigoriev, A

Shpyrko, O

Steimer, C

Pershan, PS

Ocko, BM

Deutsch, M

Lin, BH

Meron, M

Graber, T

Gebhardt, J

机构：

[1] Harvard Univ, Div Engn & Appl Sci, Cambridge, MA 02138 USA

[2] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA

[3] Brookhaven Natl Lab, Dept Phys, Upton, NY 11973 USA

[4] Bar Ilan Univ, Dept Phys, IL-52900 Ramat Gan, Israel

[5] Univ Chicago, Consortium Adv Radiat Sources, Chicago, IL 60637 USA

来源：

SURFACE SCIENCE | 2005年 / 575卷 / 03期

基金：

美国国家科学基金会;

关键词：

X-ray scattering; diffraction and reflection; oxidation; surface chemical reaction; surface structure; morphology; roughness; and topography; tin; tin oxides; liquid surfaces; polycrystalline thin films;

D O I：

10.1016/j.susc.2004.10.034

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We report the results of an X-ray scattering study that reveals oxidation kinetics and formation of a previously unreported crystalline phase of SnO at the liquid-vapour interface of Sn. Our experiments reveal that the pure liquid Sn surface does not react with molecular oxygen below an activation pressure of similar to5.0 x 10(-6)Torr. Above that pressure a rough solid Sn oxide grows over the liquid metal surface. Once the activation pressure has been exceeded the oxidation proceeds at pressures below the oxidation pressure threshold. The observed diffraction pattern associated with the surface oxidation does not match any of the known Sn oxide phases. The data have an explicit signature of the face-centred cubic structure, however it requires lattice parameters that are about 9% smaller than those reported for cubic structures of high-pressure phases of Sn oxides. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：223 / 232

页数：10

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