Carbon contamination free Ge(100) surface cleaning for MBE

被引：74

作者：

Okumura, H ^{[1
]}

Akane, T ^{[1
]}

Matsumoto, S ^{[1
]}

机构：

[1] Keio Univ, Dept Elect Engn, Yokohama, Kanagawa 223, Japan

来源：

APPLIED SURFACE SCIENCE | 1998年 / 125卷 / 01期

关键词：

Ge; GeO2; surface cleaning; wet treatment; MBE;

D O I：

10.1016/S0169-4332(97)00587-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A carbon free wet treatment for Ge(100) surface has been proposed. This treatment consists of three steps: (1) several cycles of surface oxidation with H2O2 solution and the oxide etching with HCl solution, (2) the formation of protective oxide by NH4OH/H2O2/H2O treatment and (3) thermal desorption of the protective oxide in ultra high vacuum. An atomic force microscope image of the Ge(100) surface after step (I) indicates the surface is very smooth. After step (2), it is confirmed that the protective oxide contains no carbon contamination by Anger electron spectroscopy measurement. A reflection high energy electron diffraction pattern indicates that the surface, after step (3), has only atomic-scale steps. (C) 1998 Elsevier Science B.V.

引用

页码：125 / 128

页数：4

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