Unoccupied surface states on Si(111)√3x√3-Ag

被引:36
作者
Viernow, J [1 ]
Henzler, M
O'Brien, WL
Men, FK
Leibsle, FM
Petrovykh, DY
Lin, JL
Himpsel, FJ
机构
[1] Univ Hannover, Inst Festkorperphys, D-30167 Hannover, Germany
[2] Univ Wisconsin, Ctr Synchrotron Radiat, Stoughton, WI 53589 USA
[3] Natl Chung Cheng Univ, Dept Phys, Chiayi, Taiwan
[4] Univ Missouri, Dept Phys, Kansas City, MO 64110 USA
[5] Univ Wisconsin, Dept Phys, Madison, WI 53706 USA
来源
PHYSICAL REVIEW B | 1998年 / 57卷 / 04期
关键词
D O I
10.1103/PhysRevB.57.2321
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A nearly metallic surface state band is detected on Si(111)root 3 X root 3 Ag by inverse photoemission, Si 2p core level photoemission, and scanning tunneling spectroscopy. The band spans most of the bulk band gap of Si, from the Fermi level at 0.25 eV above the valence band maximum all the way to the conduction band minimum, The Fermi level is pinned over a wide doping range (7 X 10(18) cm(-3) p type to 1.2 X 10(19) cm(-3) n type). The data suggest that the surface band gap expected from the even electron count is filled in at room temperature, possibly due to thermal disorder or due to the finite domain size of 10-20 nm. A second, prominent surface feature at 2.2 eV above the valence band maximum is assigned to surface umklapp from (K) over bar to <(Gamma)over bar> via a root 3 X root 3 reciprocal lattice vector.
引用
收藏
页码:2321 / 2326
页数:6
相关论文
共 31 条
[31]   STUDY OF AG/SI(111) SUBMONOLAYER INTERFACE .1. ELECTRONIC-STRUCTURE BY ANGLE-RESOLVED UPS [J].
YOKOTSUKA, T ;
KONO, S ;
SUZUKI, S ;
SAGAWA, T .
SURFACE SCIENCE, 1983, 127 (01) :35-47