Vertical and lateral mobilities in n-(Ga, Mn)N

被引:13
作者
Kim, J [1 ]
Ren, F
Thaler, GT
Frazier, R
Abernathy, CR
Pearton, SJ
Zavada, JM
Wilson, RG
机构
[1] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[2] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[3] USA, Res Off, Res Triangle Pk, NC 27709 USA
关键词
D O I
10.1063/1.1559442
中图分类号
O59 [应用物理学];
学科分类号
摘要
Lateral electron mobilities in 0.2-mum-thick n-(Ga, Mn)N films were obtained from Hall measurements, producing values of 116similar to102 cm(2)/V s in the temperature range from 298 to 373 K. These values are comparable to, but slightly lower than, electron mobilities in n-GaN of the same electron concentration. By sharp contrast, analysis of the reverse saturation current in mesa Schottky diodes fabricated in the n-(Ga, Mn)N show vertical electron mobilities of 840similar to336 cm(2)/V s in the temperature range from 298 to 373 K. This is consistent with a reduction in electron scattering by charged dislocations for vertical transport geometries [M. Misra, A. V. Sampath, and T. D. Moustakas, Appl. Phys. Lett. 76, 1045 (2000)]. (C) 2003 American Institute of Physics.
引用
收藏
页码:1565 / 1567
页数:3
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