A significant reduction of propagation losses in InGaAsP-InP buried-stripe waveguides by hydrogenation

被引:10
作者
Rao, EVK [1 ]
Gottesman, Y
Allovon, M
Vergnol, E
Sigogne, D
Talneau, A
Sik, H
Slempkes, S
Theys, B
Chevallier, J
机构
[1] CNET, PAB, Bagneux Lab, France Telecom SA, F-92225 Bagneux, France
[2] CNRS Bellevue, Phys Solides Lab, F-92195 Meudon, France
关键词
charge carrier processes; hydrogenated material; integrated optics; losses; passive circuits; semiconductor waveguides;
D O I
10.1109/68.661413
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We show here that the high propagation losses often measured at similar to 1.56 mu m in InGaAsP-InP buried-ridge stripe waveguides can be significantly brought down by implementing hydrogenation (exposure to deuterium plasma) as the last step to device termination, For example, losses as high as similar to 30 dB/cm measured in conventional as-processed structures have dropped down after hydrogenation to typically 4-5 dB/cm, This improved loss value is totally compatible for the realization of passive sections in photonic circuits, We further present preliminary data describing the good thermal stability of these propagation losses in post-hydrogenated structures.
引用
收藏
页码:370 / 372
页数:3
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