Origin of charge transfer complex resulting in Ohmic contact at the C60/Cu interface

被引:12
作者
Cho, S. W.
Yi, Y.
Seo, J. H.
Kim, C. Y.
Noh, M.
Yoo, K.-H.
Jeong, K.
Whang, C.-N.
机构
[1] Yonsei Univ, Inst Phys & Appl Phys, Seoul 120749, South Korea
[2] Korea Res Isnt Standards & Sci, Div Adv Technol, Deajon 305600, South Korea
[3] LOT Vacuum Co Ltd, Gyeonggi Do 456370, South Korea
基金
新加坡国家研究基金会;
关键词
energy-level alignment; metal-organic interface; gap state; charge transfer complex; dipole formation; photoemission; density functional theory calculation;
D O I
10.1016/j.synthmet.2007.01.006
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The conducting charge transfer complex formed on the C-60/Cu interface after heat treatment was investigated by using density functional theory. We optimized the geometries of the C-60 and C-60-Cu complexes. Then, a comparison of the valence band spectrum with the simulated density of states revealed detailed molecular properties. We confirm that the C-60-CU complex layer formed at the C-60/CU interface enhances charge transfer. The conducting complex creates both an occupied gap state and unoccupied states between the highest occupied molecular orbital (HOMO) and the lowest unoccupied molecular orbital (LUMO) Of C-60. These states lead to the formation of Ohmic contact between the C-60 layer and the Cu layer. (C) 2007 Elsevier B.V All rights reserved.
引用
收藏
页码:160 / 164
页数:5
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